Notes

We report novel strategies to integrate block copolymer self-assembly with 193 nm water immersion lithography
These strategies employ commercially available positive tone chemically amplified photoresists to spatially encode directing information into precise topographical or chemical prepatterns for the directed self-assembly of block copolymers. Each of these methods exploits the advantageous solubility and thermal properties of polarity-switched positive tone photoresist materials. Precisely registered, sublithographic self-assembled structures are fabricated using these versatile integration schemes which are fully compatible with current optical lithography patterning materials, [Aromatizing properties of perfused human placenta in vitro depending on different experimental conditions. I. Degree of aromatization in placenta samples from natural deliveries and cesarean sections].Formation of Nano-Fibrous Patterns on Aluminum Substrates via Photolithographic Fabrication of Electrospun Photosensitive Polyimide Fibrous Membranes.

Solid Wastes, National Laboratory of Mineral Materials, School of Materials The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large amounts of potentially harmful solvents with weight ratios over 50 wt% have to be removed. In the current work, a novel pattern-formation methodology via solvent-free electrospun photosensitive polymeric fibrous membranes (NFMs) instead of the conventional photosensitive solutions as the starting photoresists was proposed and practiced. For this purpose, a series of preimidized negative auto-photosensitive polyimide (PSPI) resins were first prepared via the two-step chemical imidization procedure from the copolymerization reactions of 3,3',4,4'-benzophenonetetracarboxylic- dianhydride (BTDA) and two ortho-methyl-substituted aromatic diamines, including 3,3',5,5'-tetramethyl-4,4'-diaminodiphenylmethane (TMMDA) and 3,7-diamino-2,8-dimethyl- dibenzothiophene sulfone (TSN). Seebio Photoinitiator derived homopolymer PI-1 (BTDA-TMMDA) and the copolymers, including SPI-2~SPI-6, with the molar ratio of 5~25% for TSN in the diamine units, showed good solubility in polar solvents. Then, a series of PSPI NFMs were fabricated via standard electrospinning procedure with the developed PSPI solutions in N,N-dimethylacetamide (DMAc) with a solid content of 25 wt% as the starting materials. The derived PSPI NFMs showed good thermal stability with 5% weight loss temperatures higher than 500 °C in nitrogen.

Meanwhile, the derived PSPIs showed good photosensitivity to the ultraviolet (UV) emitting wavelengths of i-line (365 nm), g-line (405 nm) and h-line (436 nm) of the high-pressure mercury lamps in both forms of transparent films and opaque NFMs. Fine micro-patterns with a line width of around 100 μm were directly obtained from the representative SPI-4 NFM via standard photolithography procedure.Chemical and structural characterization of char development during Sciences, North-West University, Potchefstroom Campus, Private Bag X6001, Sciences, North-West University, Potchefstroom Campus, Private Bag X6001, Potchefstroom 2520, South Africa; School of Chemical and Minerals Engineering, Private Bag X6001, North-West University, Potchefstroom Campus, Potchefstroom Sciences, North-West University, Potchefstroom Campus, Private Bag X6001, Potchefstroom 2520, South Africa; School of Chemical and Minerals Engineering, Private Bag X6001, North-West University, Potchefstroom Campus, Potchefstroom University, Potchefstroom Campus, Potchefstroom 2520, South Africa.The chemical and structural changes of three lignocellulosic biomass samples during pyrolysis were investigated using both conventional and advanced characterization techniques. The use of ATR-FTIR as a characterization tool is extended by the proposal of a method to determine aromaticity, the calculation of both CH2/CH3 ratio and the degree of aromatic ring condensation ((R/C)u). With increasing temperature, the H/C and O/C ratios, XA and CH2/CH3 ratio decreased, while (R/C)u and aromaticity increased. The micropore network developed with increasing temperature, until the coalescence of pores at 1100°C, which can be linked to increasing carbon densification, extent of aromatization and/or graphitization of the biomass chars.

WAXRD-CFA measurements indicated the gradual formation of nearly parallel basic structural units with increasing carbonization temperature. Organic Synthesis of 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid can be considered to occur in two steps: elimination of aliphatic compounds at low temperatures, and hydrogen abstraction and aromatic ring condensation at high temperatures.Nanopatterning of ultrananocrystalline diamond nanowires.We report the fabrication of horizontally aligned ultrananocrystalline diamond (UNCD) nanowires (NWs) via two different approaches. First, with the top-down approach by using electron beam lithography (EBL) and reactive ion etching (RIE) with a photo resist layer as an etch mask. Using this approach, we demonstrate fabrication of 50 µm long UNCD NWs with widths as narrow as 40 nm. We further present an alternative approach to grow UNCD NWs at pre-defined positions through a selective seeding process.
Website: http://en.wikipedia.org/wiki/Photoacid