Notes

Furthermore, the severity of reproductive dysfunction is amplified by excess postnatal weight gain
The constellation of adult reproductive and metabolic dysfunction in prenatal testosterone-treated sheep is similar to features seen in women with polycystic ovary syndrome. Prenatal dihydrotestosterone treatment failed to result in similar phenotype suggesting that many effects of prenatal testosterone excess are likely facilitated via aromatization to oestradiol. Similarly, exposure to environmental steroid imposters such as bisphenol A (BPA) and methoxychlor (MXC) from days 30 to 90 of gestation had long-term but differential effects. Exposure of sheep to BPA, which resulted in maternal levels of 30-50 ng/mL BPA, culminated in low birth weight offspring. These female offspring were hypergonadotropic during early postnatal life and characterized by severely dampened preovulatory LH surges. Prenatal MXC-treated females had normal birth weight and manifested delayed but normal amplitude LH surges.

Importantly, the effects of BPA were evident at levels, which approximated twice the highest levels found in human maternal circulation of industrialized nations. These findings provide evidence in support of developmental origin of adult reproductive and metabolic diseases and highlight the risk posed by exposure to environmental endocrine disrupting chemicals.Three-dimensional direct laser written achromatic axicons and multi-component Schmid M, Thiele S, Herkommer A, Giessen H.Femtosecond 3D printing is an important technology for manufacturing nano- and microscopic optical devices and elements. However, most structures in the past have been created using only one photoresist at a time, thus limiting potential applications. In this Letter, we successfully demonstrate the combination of two different photoresists, namely, IP-S and IP-Dip, to realize multi-component three-dimensional direct laser written optics. We use the combination of IP-S and IP-Dip to correct chromatic aberrations and to realize an achromatic axicon.

In a second step, we demonstrate, to the best of our knowledge, the first three-dimensional direct laser written Fraunhofer doublet. We characterize their optical properties and measure the substantial reduction in chromatic aberrations. We outline the possibilities and benefits of creating three-dimensional direct laser written multi-component structures for Reduction photolithography using microlens arrays: applications in gray scale This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of approximately 2 x 2 cm2. 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid in Electrophilic Aromatic Substitution consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements.

Arrays of 40- and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.Fabrication of three-dimensional photonic crystals with multilayer Yao P, Schneider G, Prather D, Wetzel E, O'Brien D.We have developed a new approach for the fabrication of three-dimensional (3D) photonic crystals based on multilayer 3D photolithography. This method, which uses commercially available photoresist, allows batch fabrication of 3D photonic crystals (PhCs), possesses the flexibility to create a variety of different lattice arrangements, and provides the freedom for arbitrary defect introduction. We describe in this paper how planar lithography is modified to achieve 3D confined exposure and multiple resist application. We demonstrated the fabrication of multilayer "woodpile" structures with and without engineered defects. We further infiltrated the resist template using a higher-index material and obtained the inverse 3D PhC structure.

Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask Films of self assembled diblock copolymers (BCPs) have attracted significant attention for generating semiconductor nanoarrays of sizes below 100 nm through a simple low cost approach for device fabrication. A challenging abstract is controlling microdomain orientation and ordering dictated by complex interplay of surface energies, polymer-solvent interactions and domain spacing. In context, microphase separated poly (styrene-b-ethylene oxide) (PS-b-PEO) thin films is illustrated to fabricate nanopatterns on silicon and germanium materials trenches. The trenched templates was produced by simple electron beam lithography using hydrogen silsesquioxane (HSQ) resist. The orientation of PEO, minority cylinder forming block, was controlled by controlling trench width and varying solvent annealing parameters viz. temperature, time etc. A noticeable difference in microdomain orientation was observed for Si and Ge trenches processed under same conditions.

The Ge trenches promoted horizontal orientations compared to Si due to difference in surface properties without any prior surface treatments.
Here's my website: https://www.daoduytu.edu.vn/forum/links.php?url=http://en.wikipedia.org/wiki/Photoresist