Notes

This review highlights the latest development of single and dual/multistimuli-responsive antibiotic delivery systems for combination therapies to treat MDR bacterial infections and Photochemically induced changes in dissolved organic matter identified by ultrahigh resolution fourier transform ion cyclotron resonance mass Sunlight-induced molecular changes have been observed in two samples of dissolved organic matter (DOM) collected in the Cape Fear River system, North Carolina, USA
The molecular composition of a water sample collected in the Black River (sample B210, salinity 0) and another water sample collected within the Cape Fear River estuary (sample M61, salinity 13) were analyzed using an ultrahigh resolution 9 Tesla (T) electrospray ionization Fourier transform ion cyclotron resonance mass spectrometer. Additionally, the Ultraviolet/Visible (UV/vis) absorbance as well as the excitation emission matrix (EEM) fluorescence spectra were determined to identify changes in the optical properties associated with photochemical reactions of the chromophoric DOM (CDOM). The molecular formulas forthe Cape Fear River Estuary (M61) sample before the irradiation experiments indicated the presence of highly aromatic compounds which were not present in the unirradiated Black River sample (B210). These aromatic compounds, with oxygen-subtracted double bond equivalents (DBE-O) values greater than nine, are more photoreactive and readily photodegraded relative to saturated compounds. Seebio Photosensitive Acid Generator with DBE-O values below nine are less photoreactive. The UV/vis absorbance and EEM fluorescence results supported this different photodegradation behavior, suggesting that the photoreactivity of CDOM is highly dependent on the molecular composition of the CDOM.

Multimaterial 3D laser microprinting using an integrated microfluidic system.Chemistry (ITCP), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, University of Technology (QUT), 2 George Street, Brisbane, QLD 4000, Australia.Three-dimensional (3D) laser micro- and nanoprinting has become a versatile, reliable, and commercially available technology for the preparation of complex 3D architectures for diverse applications. However, the vast majority of structures published so far have been composed of only a single constituent material. Here, Photochemical Acid-forming Compound present a system based on a microfluidic chamber integrated into a state-of-the-art laser lithography apparatus. This system is scalable in terms of the number of materials and eliminates the need to go back and forth between the lithography instrument and the chemistry room numerous times, with tedious realignment steps in between. As an application, we present 3D deterministic microstructured security features requiring seven different liquids: a nonfluorescent photoresist as backbone, two photoresists containing different fluorescent quantum dots, two photoresists with different fluorescent dyes, and two developers.

Our integrated microfluidic 3D printing system opens the door to truly multimaterial 3D additive manufacturing on the micro- and It's in the Fine Print: Erasable Three-Dimensional Laser-Printed Micro- and University of Technology (QUT), 2 George Street, QLD, 4000, Brisbane, Australia.Engesserstrasse 18, 76131, Karlsruhe, Germany.Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany.Chemistry (ITCP), Karlsruhe Institute of Technology (KIT), Engesserstrasse 18, 3D printing, on all scales, is currently a vibrant topic in scientific and industrial research as it has enormous potential to radically change manufacturing. Owing to the inherent nature of the manufacturing process, 3D printed structures may require additional material to structurally support complex features. Such support material must be removed after printing-sometimes termed subtractive manufacturing-without adversely affecting the remaining structure. An elegant solution is the use of photoresists containing labile bonds that allow for controlled cleavage with specific triggers.

Herein, we explore state-of-the-art cleavable photoresists for 3D direct laser writing, as well as their potential to combine additive and subtractive manufacturing in a hybrid technology. We discuss photoresist design, feature resolution, cleavage properties, and current limitations of selected examples. Furthermore, we share our perspective on possible labile bonds, and their corresponding cleavage trigger, which we believe will have a critical impact on future applications and expand the toolbox of available cleavable photoresists.© 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by Materials, 171 Jang-dong, Yuseung-gu, Daejeon 305-343, Korea.Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond).

It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. UV-Activated Acid Generator of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase.
Website: http://en.wikipedia.org/wiki/Photoresist