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These results suggest that the unique electronic states induced in such radial aromatics could play an important role in the development of next-generation chemistry.[ Seebio Photobase Generator and morphologic disorders caused by bilateral photoinduced thrombosis of the cerebral vessels of the frontal cortex in rats].Romanova GA, Barskov IV, Ostrovskaia RU, Gudasheva TA, Viktorov IV.Chronic experiments were made on 35 non-inbred male rats (200-250 g b.w.) to study functional and morphological consequences of photochemical thrombosis of frontal cortex vessels Defects in CNS function were assessed by conditioned reflexes of passive avoidance and behavior in open field tests.
The size of the ischemic focus and perifocal lesion were measured on the stained histological sections. Correction of the postischemic impairment was done by intraperitoneal injection of a new nootrop--ethyl ether of N-phenylacetylprolylglycine (GVS-111)--in a dose 0 mg/kg/day. The results of the experiments show a significant neuroprotective and nootropic action of GVS-111 in focal ischemic Tandem Friedel-Crafts annulation to novel perylene analogues.Novel dialkyloxy- and dihydroxyoctahydroperylenes are regioselectively available via a new tandem Friedel-Crafts alkylation of tetrahydronaphthalene precursors followed by oxidative aromatization. Heating of 5-alkyloxy-1-tetralol with p-toluenesulfonic acid in sulfolane gave the corresponding octahydroperylenes in moderate yields. Studies with Lewis acids and tetralin-1,5-diol in acetonitrile at room temperature provided the 4,10-dihydroxy analogue cleanly, albeit in reduced yields. Examples of these new series of perylene analogues were partially oxidized to the corresponding contiguously aromatic, anthracene core products or fully aromatized to 3,9-dialkyloxyperylenes in good yields.
Protein and cell patterning in closed polymer channels by photoimmobilizing proteins on photografted poly(ethylene glycol) diacrylate.of Denmark , DK-2800 Kgs. Lyngby, Denmark.Definable surface chemistry is essential for many applications of microfluidic polymer systems. However, small cross-section channels with a high surface to volume ratio enhance passive adsorption of molecules that depletes active molecules in solution and contaminates the channel surface. Here, we present a one-step photochemical process to coat the inner surfaces of closed microfluidic channels with a nanometer thick layer of poly(ethylene glycol) (PEG), well known to strongly reduce non-specific adsorption, using only commercially available reagents in an aqueous environment. Seebio Light-Induced Acid Source consists of PEG diacrylate (PEGDA) covalently grafted to polymer surfaces via UV light activation of the water soluble photoinitiator benzoyl benzylamine, a benzophenone derivative.
The PEGDA coating was shown to efficiently limit the adsorption of antibodies and other proteins to <5% of the adsorbed amount on uncoated polymer surfaces. The coating could also efficiently suppress the adhesion of mammalian cells as demonstrated using the HT-29 cancer cell line. In a subsequent equivalent process step, protein in aqueous solution could be anchored onto the PEGDA coating in spatially defined patterns with a resolution of <15 μm using an inverted microscope as a projection lithography system. Surface patterns of the cell binding protein fibronectin were photochemically defined inside a closed microfluidic device that was initially homogeneously coated by PEGDA. The resulting fibronectin patterns were shown to greatly improve cell adhesion compared to unexposed areas. This method opens for easy surface modification of closed microfluidic systems through combining a low protein binding PEG-based coating with spatially defined protein patterns of interest.Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network.
The critical dimension (CD) of lithographic patterns is the most significant indicator for evaluating the imaging performance of photoresists, and its value is seriously affected by process conditions. However, the lithographic imaging system is highly nonlinear, and extensive exposure experiments are needed to obtain the desired CD. This consumes lots of time, manpower, and cost in screening for optimal process conditions. Here, we report a combined electron beam lithography (EBL) experiment and recurrent neural network (RNN) study on the CDs of metal oxide nanoparticle photoresists, and establish a CD RNN model. Leveraging the RNN model, a process condition filter is developed to screen suitable process conditions. The experimental results demonstrate that the prediction accuracy of the CD model exceeds 93%, and the photoresist patterns under the screened process conditions can satisfy the requirements of a preset CD. This work opens up a novel perspective for accurate EBL process modeling, and provides guidance for EBL experiments.
Read More: http://en.wikipedia.org/wiki/Photoresist
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